P. BASA, P. PETRIK
SiNx/nc-Si/SiNx Multilayers: A Spectroscopic Ellipsometric Study

Abstract.
Low-pressure chemical vapour deposited and annealed SiNx/nc-Si/SiNx layers prepared on Si substrates were characterized by spectroscopic ellipsometry. The effective medium approximation model was used to obtain the thickness, the composition and homogeneity of the layers. A significant effect of the deposition time and annealing process was obtained.

Keywords: SiNx, nc-Si, silicon nitride, nanocrystals, ellipsometry, annealing.